SPIE Advanced Lithography 2010
Edited: 2010/01/27
nanoUV has been exhibiting at the SPIE Advanced Lithography SAN JOSE 2010 conference and exhibition, 21 - 25 February 2010, being held at the San Jose Convention Center.
nanoUV was introduce its ultra bright sources for EUV Metrology:
HYDRA-4ABITM source for actinic Mask Blank Inspection
[...] Read more
@ SAN JOSE, USA > Link
SPIE Taiwan 2009
Edited: 2009/05/06
November 18-19 2009, NanoUV presented both a modelling study and the experimental results of the i-SoCoMo concept, an impulse discharge plasma source with an integrated photon collector based on an active plasma structure. The small physical size and low etendue properties of the [...] Read more
@ Taipe, Taiwan
EUV Source Workshop
Edited: 2009/05/06
nanoUV attented the Sematech Knowledge Series "EUV Source Workshop" organised by Sematech, in Baltimore on May 29-30.
Our President and Director of Technology, Dr Peter Choi presented a paper on "High Brightness next Generation EUV Lithograph Light Source for Metrology" as to fulfill market needs.
@ Baltimore, USA
SPIE San Jose 2009
Edited: 2009/01/23
nanoUV attended the SPIE Advanced Lithography SAN JOSE 2009, on the 22 - 27 February 2009, at the San Jose Convention Center.
nanoUV introduced (FEB-09) to the market an exceptionally bright EUV light source dedicated for MASK Inspection, the HYDRA 12TM BE18, with an irradiance of 1018 [...] Read more
@ San Jose, USA
SEMICON JAPAN 2008
Edited: 2008/11/26
nanoUV attended the SEMICON JAPAN 2008, December 3 to 5, at the Makuhari Messe, Chiba, Japan.
Peter Choi, President and Director of Technology has given an oral presentation in the "exhibitor seminar area", on Wednesday the 3rd of Dec, Hall 4, Room 2, from 10:30 to 11:20: " nano-UV delivers the [...] Read more
@ Chiba, Japan > Link
EUVL symposium in Lake Tahoe
Edited: 2008/08/26
The 2008 EUVL Symposium is a key industry forum for industry experts and researchers to discuss and assess the continuing progress and maturity of extreme ultraviolet lithography (EUVL) technology and the infrastructure needed to support its insertion into production.
nanoUV was proud to sponsor [...] Read more
@ Lake Tahoe, California
SEMICON West
Edited: 2008/07/08
nanoUV team attended the SEMICON West tradeshow in San Francisco, this event attracts the world’s leading innovation companies who are responsible for the technologies that enable the microelectronics that drive today’s most sophisticated consumer and commercial electronic products.
@ San Francisco, USA
2009 International Symposium on Extreme Ultraviolet Lithography
Edited: 2009/05/06
nanoUV presented to the 2009 International Symposium on Extreme Ultraviolet Lithography, held in Prague October 18-21, the latest results obtained for their high brightness next generation multiplexed EUV light sources. The sources have been developed for industrial applications in the fields EUV [...] Read more
@ Prague, Czech Republic > Link
SEMATECH Workshop
Edited: 2008/05/13
In 2008, the power of a fully integrated EUV source is projected to increase from 4W to approximately 100W at Intermediate Focus. To reach this target by the end of 2008 requires that the source power double approximately every two months. This SEMATECH workshop -which brings together source [...] Read more
@ Bolton Landing (Lake George), NY > Link
SPIE
Edited: 2008/02/15
California, USA. February 26-27th, 2008, nanoUV attented the SPIE Advanced Lithography Conference at San Jose (CA) 2008. nanoUV introduced to the market the fist nanoUV product a table top EUV source, CYCLOPSTM BE16 providing 1016 photons/cm²/s for metrology applications.
@ San Jose (CA, USA) > Link