NANO-UV news

SEMICON West

Edited: 2008/07/08

NANO-UV will exhibit at SEMICON West in San Francisco, attracts the world’s leading innovation companies who are responsible for the technologies that enable the microelectronics that drive today’s most sophisticated consumer and commercial electronic products.


@ San Francisco, USA  [ www.semiconwest.org/ ]

SEMATECH Workshop

Edited: 2008/05/13
In 2008, the power of a fully integrated EUV source is projected to increase from 4W to approximately 100W at Intermediate Focus. To reach this target by the end of 2008 requires that the source power double approximately every two months. This SEMATECH workshop -which brings together source suppliers, exposure tool suppliers, academia/researchers, and other experts focused on aggressively pursuing the lithography technology roadmap- will update attendees on the recent progress being made in source performance and provide a critical review of the challenges restricting the enhancement of this technology.
See link to learn more.
@ Bolton Landing (Lake George), NY  [ sematech.org/meetings/announcements/8408/ ]

SPIE

Edited: 2008/02/15
California, USA. February 26-27th, 2008, NANO-UV will exhibit at the next SPIE Advanced Lithography Conference at San Jose (CA). Please come and visit us to find out more about our breakthrough EUV light source technology and related products.
@ San Jose (CA, USA)  [ Contact ] [ www.spie.org ]