SEMICON West

2008/07/08 @ San Francisco, USA

NANO-UV will exhibit at SEMICON West in San Francisco, attracts the world’s leading innovation companies who are responsible for the technologies that enable the microelectronics that drive... [more]

 

INFO GATE

Did you know ?

We thought that it would be nice to have a gateway to provide more information to our non technical visitors on some of the science and technology behind our products. We would welcome your input to enlarge and to enrich this database.

Supporting EUVL for the 32 nm node

Welcome to NANO-UV
NANO-UV has developed a light source for next generation lithography (NGL) based on EUV technology. With our groundbreaking technology we can supply light sources to support the deployment of EUVL for the 32nm node and beyond. This will make chips smaller and more powerful and will satisfy the need of chip manufacturers for at least the next decade. NANO-UV provides the world's brightest EUV light source for EUV HVM lithography and metrology industries. See video teaser

The world's brightest EUV source

NANO-UV is the first company ever to deploy PlasmaLens™ technology in a viable architecture. This means we can place our light collection and projection optics much closer to the light source than has ever been thought possible. We have a source that can produce EUV light at the brightness levels normally encountered in costly synchrotrons (fig. i-SoCoMo™ "Intrinsic Source Collector module").

Exclusive partnership with EPPRA

NANO-UV, based near Paris, France, specializes in Extreme Ultra-Violet (EUV) product development and distribution.
NANO-UV works in exclusive partnership with EPPRA, a well established R&D company that has been active in the field of pulsed power and plasma applications for many years.