(*) Irradiance (13.5 nm, 4% BW) 67 cm from the source
Thanks to its revolutionary PlasmaLens™ technology, NANO-UV's source sets new standards for design and simplicity. This means absolute reliability in a physical package many times smaller than previous generation solutions. Thanks to those dimensions, modular multiplexing of hundreds of sources is now possible.
NANO-UV can support EUVL deployment for the whole industry at the 32nm node. And built-in scalability means we will go on enabling EUVL right through to 16nm node and beyond.
Features and benefits