HYDRA - AIMS

The HYDRA^TM- AIMS utilises a 12 way multiplexing technology where each i-SoCoMo^TM unit runs at 5 kHz. This now fills the gap in the infrastructure of EUV lithography processes technology by providing a convenient source technology for the next generation of Aerial Mask Inspection Tools. Aerial imaging emulates the imaging process of the stepper/scanner in a wafer fabrication facility. With feature sizes now heading below the 45 nm node the inspection of masks for the smallest of defects that may be printable in the lithographic process is even more critical. At this stage a single such defect can render an entire batch of wafers dysfunctional with a large attendant cost. Detailed inspection and emulation of the lithographic process can identify these problem areas and strategies for mask repair can be proposed. In the high volume regime there is a requirement for high source radiance to provided suitably low noise signal levels for the inspection process for a minimum in inspection time.