Bright new multiplexed light sources
Nano-UV announced the launch of its new EUV sources to its HYDRATM product range recently.
HYDRATM – ABI (Actinic Blank Inspection), HYDRATM - AIMS (Aerial imaging measurement
system) and HYDRATM – APMI (Actinic Patterned Mask Inspection) have all been developed to meet the
demanding specifications set by the requirements of the actinic inspection tools needed for next generation semiconductor wafer
fabrication and the 22 nm node and below, using EUVL technologies.
These source development breakthroughs have been made possible by the unique impulse micro discharge plasma and photon
collecting technology i-SoCoMoTM, which powers the new GEN II HYDRATM source units. The
configurable design philosophy adopted in HYDRATM, makes possible the unprecedented high levels of EUV brightness from
the small footprint systems, along with their high reliability, scalability and cost effectiveness. The spatial and time
multiplexing of the source units makes these the brightest EUV sources available, even exceeding that attainable at large
- The HYDRATM- ABI has been optimised to meet the system requirements
of next generation mask blank actinic inspection tools. Exploiting the shorter wavelengths and brightness of
HYDRATM - ABI, makes possible the detection of defect structures in mask blanks corresponding to printed features
sizes of 5 nm at the wafer. Good signal levels and hence discrimination of defect regions are achievable by using the combined
brightness of four i-SoCoMoTM units running in a multiplexed mode in HYDRATM - ABI. This total pulsed
rate of 12 kHz provides the required brightness levels for blank mask inspection, making the HYDRATM - ABI the
only off-the-shelf source solution for mask blank inspection available today.
- The HYDRATM- AIMS utilises a 12 way multiplexing technology where
each i-SoCoMoTM unit runs at 5 kHz. This now fills the gap in the infrastructure of EUV lithography processes
technology by providing a convenient source technology for the next generation of Aerial Mask Inspection Tools.
- The HYDRATM- APMI has been tailored to meet the requirements of
Aerial Patterned Mask Inspection tools. This is achieved by the multiplexed operation of eight i-SoCoMoTM units
where the goal is to be able to detect patterned mask defects at the 22 nm node and below.