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(Stepper) The detailed patterns in semiconductor device fabrication are transferred using a type of stepper called a scanner, which moves the wafer and photomask with respect to each other during the exposure to increase the size of the area exposed. Elements of the circuit to be created on the IC are reproduced in a pattern of transparent and opaque areas on the surface of a plate called a photomask. The stepper passes light through the reticle, forming an image of the photomask pattern. The image is focused and reduced by a lens, and projected onto the surface of a silicon wafer that is coated with a photosensitive material called a photoresist.