nanoUV attended the SPIE Advanced Lithography SAN JOSE 2009, on the 22 - 27 February 2009, at the San Jose Convention Center.
nanoUV introduced (FEB-09) to the market an exceptionally bright EUV light source dedicated for MASK Inspection, the HYDRA 12TM BE18, with an irradiance of 1018 photon/cm2/s in the EUV band, at the intermediate focus (IF)( Brighter than a synchrotron). This source encountered an important interest from the industry as it is the first multiplexed source available as a product to the industry, showing nanoUV Know How and a step ahead the competition between the source manufacturers.
nanoUV presented a paper on "High-performance next-generation EUV lithography light source".
Show Abstract, paper 7271-106.
nanoUV has welcome visitors at the Exhibition Center on booth 117, and offered to the first 500 showing up a "green product" a nice USB KEY in wood has been offered to everyone showing up visiting nanoUV booth.
@ San Jose, USA