Edited: 2008/05/13
In 2008, the power of a fully integrated EUV source is projected to increase from 4W to approximately 100W at Intermediate Focus. To reach this target by the end of 2008 requires that the source power double approximately every two months. This SEMATECH workshop -which brings together source suppliers, exposure tool suppliers, academia/researchers, and other experts focused on aggressively pursuing the lithography technology roadmap- will update attendees on the recent progress being made in source performance and provide a critical review of the challenges restricting the enhancement of this technology.
@ Bolton Landing (Lake George), NY > Link