
We thought that it would be nice to have a gateway to provide more information to our non technical visitors on some of the science and technology behind our products. We would welcome your input to enlarge and to enrich this database.
In the photolithography process, elements to be created on the IC are reproduced in a pattern of transparent and opaque areas on the surface of a quartz plate called a photomask. The scanner passes light through the photomask, forming an image of the photomask pattern. The image is focused and reduced by a lens, and projected onto the surface of a silicon wafer that is coated with a photosensitive material called a photoresist. After exposure in the scanner, the coated wafer is developed like photographic film.