Edited: 2009/05/06
nanoUV presented to the 2009 International Symposium on Extreme Ultraviolet Lithography, held in Prague October 18-21, the latest results obtained for their high brightness next generation multiplexed EUV light sources. The sources have been developed for industrial applications in the fields EUV interferometer, Metrology, and Inspection.
nanoUV is instrumental in helping industry by providing source solutions for the challenging HVM requirements of Metrology, Inspection and EUV Lithography.
@ Prague, Czech Republic