Supporting EUVL for the 22 nm node

Welcome to NANO-UV
NANO-UV has developed a light source for next generation lithography (NGL) based on EUV technology. With our groundbreaking technology we can supply light sources to support the deployment of EUVL for the 22nm node and beyond. This will make chips smaller and more powerful and will satisfy the need of chip manufactures for at least the next decade. NANO-UV provides the world's brightest EUV light source for EUV HVM lithography and metrology industries.
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New EUV Metrology sources

HYDRA^TM - ABI, HYDRA^TM - AIMS and HYDRA^TM - APMI have all been developed to meet the demanding specifications set by the requirements of the actinic inspection tools needed for next generation semiconductor wafer fabrication and the 22 nm node and below, using EUVL technologies.
These source development breakthroughs have been made possible by the unique... read more

The world's brightest EUV source

NANO-UV is the first company ever to deploy PlasmaLens™ technology in a viable architecture. This means we can place our light collection and projection optics, much closer to the light source than has ever been thought possible. We have a source that can produce EUV light at the brightness levels normally encountered in costly Synchrotrons. (fig. i-SoCoMo^TM "Intrinsic Source Collector module").

Exclusive partnership with EPPRA

NANO-UV sas, based near Paris, France, is specialized in Extreme Ultra-Violet (EUV) product development and distribution.
It has designed and perfected a breakthrough compact light source for applications in industries such as EUV HVM lithography and metrology. NANO-UV works in exclusive partnership with EPPRA, a well established R&D Company that has been active in the field of pulsed power and plasma applications for many years.