
February 26-27th, 2008: NANO-UV will exhibit at the next SPIE Advanced Lithography Conference at San Jose (CA). Please come and visit us to find out more about our breakthrough EUV light source technology and related products.
Welcome to NANO-UV
NANO-UV has developed a light source for next generation lithography (NGL) based
on EUV technology. With our groundbreaking technology we can supply light sources
to support the deployment of EUVL for the 32nm node and beyond. This will make
chips smaller and more powerful and will satisfy the need of chip manufactures
for at least the next decade. NANO-UV provides the world's brightest
EUV light source for EUV HVM lithography and metrology industries. See video teaser
NANO-UV is the first
company ever to deploy PlasmaLens™ technology in a viable architecture.
This means we can place our light collection and projection optics, much closer
to the light source than has ever been thought possible. We have a source that
can produce EUV light at the brightness levels normally encountered in costly
Synchrotrons. (fig. i-SoCoMo™ "Intrinsic Source Collector module").
NANO-UV sas, based near Paris, France, is specialized in Extreme Ultra-Violet (EUV) product development and distribution.
It has designed and perfected a breakthrough compact light source for applications in industries such as EUV HVM lithography and metrology. NANO-UV works in exclusive partnership with EPPRA, a well established R&D Company that has been active in the field of pulsed power and plasma applications for many years.