California, USA

February 26-27th, 2008: NANO-UV will exhibit at the next SPIE Advanced Lithography Conference at San Jose (CA). Please come and visit us to find out more about our breakthrough EUV light source technology and related products.

 

INFO GATE

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We thought that it would be nice to have a gateway to provide more information to our non technical visitors on some of the science and technology behind our products. We would welcome your input to enlarge and to enrich this database.

Supporting EUVL for the 32 nm node

Welcome to NANO-UV
NANO-UV has developed a light source for next generation lithography (NGL) based on EUV technology. With our groundbreaking technology we can supply light sources to support the deployment of EUVL for the 32nm node and beyond. This will make chips smaller and more powerful and will satisfy the need of chip manufactures for at least the next decade. NANO-UV provides the world's brightest EUV light source for EUV HVM lithography and metrology industries. See video teaser

The world's brightest EUV source

NANO-UV is the first company ever to deploy PlasmaLens™ technology in a viable architecture. This means we can place our light collection and projection optics, much closer to the light source than has ever been thought possible. We have a source that can produce EUV light at the brightness levels normally encountered in costly Synchrotrons. (fig. i-SoCoMo™ "Intrinsic Source Collector module").

Exclusive partnership with EPPRA

NANO-UV sas, based near Paris, France, is specialized in Extreme Ultra-Violet (EUV) product development and distribution.
It has designed and perfected a breakthrough compact light source for applications in industries such as EUV HVM lithography and metrology. NANO-UV works in exclusive partnership with EPPRA, a well established R&D Company that has been active in the field of pulsed power and plasma applications for many years.