EUV Source Workshop

2009/05/06 @ Baltimore, USA

nanoUV will participate to the Sematech Knowledge Series "EUV Source Workshop" organised by Sematech, in Baltimore on May 29-30. Instrument manufacturers, Sematech, and Selete, will introduce the EUV Source needs and... [more]

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We thought that it would be nice to have a gateway to provide more information to our non technical visitors on some of the science and technology behind our products. We would welcome your input to enlarge and to enrich this database.

Supporting EUVL for the 22 nm node

Welcome to NANO-UV
NANO-UV has developed a light source for next generation lithography (NGL) based on EUV technology. With our groundbreaking technology we can supply light sources to support the deployment of EUVL for the 22nm node and beyond. This will make chips smaller and more powerful and will satisfy the need of chip manufactures for at least the next decade. NANO-UV provides the world's brightest EUV light source for EUV HVM lithography and metrology industries. See video teaser

The world's brightest EUV source

NANO-UV is the first company ever to deploy PlasmaLens™ technology in a viable architecture. This means we can place our light collection and projection optics, much closer to the light source than has ever been thought possible. We have a source that can produce EUV light at the brightness levels normally encountered in costly Synchrotrons. (fig. i-SoCoMo™ "Intrinsic Source Collector module").

Exclusive partnership with EPPRA

NANO-UV sas, based near Paris, France, is specialized in Extreme Ultra-Violet (EUV) product development and distribution.
It has designed and perfected a breakthrough compact light source for applications in industries such as EUV HVM lithography and metrology. NANO-UV works in exclusive partnership with EPPRA, a well established R&D Company that has been active in the field of pulsed power and plasma applications for many years.

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