
2010/01/27 @ SAN JOSE, USA
nanoUV will be exhibiting at the SPIE Advanced Lithography SAN JOSE 2010 conference and exhibition, 21 - 25 February 2010, being held at the San Jose Convention Center. Our exhibition takes place on the Tuesday 23rd and... [more]
Welcome to NANO-UV
NANO-UV has developed a light source for next generation lithography (NGL) based
on EUV technology. With our groundbreaking technology we can supply light sources
to support the deployment of EUVL for the 22nm node and beyond. This will make
chips smaller and more powerful and will satisfy the need of chip manufactures
for at least the next decade. NANO-UV provides the world's brightest
EUV light source for EUV HVM lithography and metrology industries. See video teaser
At the recent symposium EUV lithography conference, Prague 18-21 October 2009, Nano-UV announced the launch of its three new EUV sources to its HYDRATM product range.
HYDRATM - ABI, HYDRATM - AIMS and HYDRATM - APMI have all been developed to meet the demanding specifications set by the requirements of the actinic inspection tools needed for next generation semiconductor wafer fabrication and the 22 nm node and below, using EUVL technologies.
These source development breakthroughs have been made possible by the unique... read more
NANO-UV is the first
company ever to deploy PlasmaLens™ technology in a viable architecture.
This means we can place our light collection and projection optics, much closer
to the light source than has ever been thought possible. We have a source that
can produce EUV light at the brightness levels normally encountered in costly
Synchrotrons. (fig. i-SoCoMoTM "Intrinsic Source Collector module").
NANO-UV sas, based near Paris, France, is specialized in Extreme Ultra-Violet (EUV) product development and distribution.
It has designed and perfected a breakthrough compact light source for applications in industries such as EUV HVM lithography and metrology. NANO-UV works in exclusive partnership with EPPRA, a well established R&D Company that has been active in the field of pulsed power and plasma applications for many years.